Meeting the Challenge of Micro- and Nano-Manufacturing with Plasma
Enormous progress has been made in many high technology fields in recent years, which is partly due to development of new micro- and nano-manufacturing processes used to create advanced materials and structures. Several of these processes use plasma, which provides a medium for carrying out processes that would be difficult, if not impossible, to carry out in conventional physical or chemical mediums.
The research conducted by Dr. Mohamed Chaker at the INRS-Énergie, Matériaux et Télécommunications, will have two main thrusts. He will study plasma used for material synthesis and etching, and integrate these micro- and nano-manufacturing processes to develop radio frequency and photonic components.
Dr. Chaker has been a professor at the INRS-Énergie, Matériaux et Télécommunications since 1989. As an expert on laser-produced plasma, he has an impressive record of accomplishments in the areas of laser-produced plasma for X-ray generation and its applications to X-ray and EUV lithography, laser-produced plasma for new material synthesis and high-density plasma for material etching.
The first component of his research, the synthesis of materials by laser-produced plasma, will focus on the influence of laser pulse duration (subpicosecond to a nanosecond) on the synthesis of metallic silicides, of high dielectric constant materials and of photonic materials. This component will also incorporate a study of high-density plasma etching for producing patterns on the nanoscale. The second focus of the research program is on the production of ferro-electric RF components as well as electro-optical photonic components.
Dr. Chaker's research will contribute to ongoing advanced plasma research, help improve micro- and nano-manufacturing processes, and integrate this micro- and nano-structure technology with the development of innovative RF and photonic components.